Growth precursors in a remote silane plasma related to a-Si: H film quality

W.M.M. Kessels, M.C.M. van de Sanden, A.H.M. Smets, B.A. Korevaar, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)265-267
Number of pages3
JournalVide: Science, Technique et Applications
Issue number291 SUPPL.2
Publication statusPublished - 1 Dec 1999

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