Growth precursors in a remote silane plasma related to a-Si:: H film quality

Growth precursors in a remote silane plasma related to a-Si: H film quality

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Pages (from-to)	265-267
Number of pages	3
Journal	Vide: Science, Technique et Applications
Issue number	291 SUPPL.2
Publication status	Published - 1 Dec 1999

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title = "Growth precursors in a remote silane plasma related to a-Si:: H film quality",

author = "W.M.M. Kessels and {van de Sanden}, M.C.M. and A.H.M. Smets and B.A. Korevaar and D.C. Schram",

year = "1999",

month = dec,

day = "1",

language = "English",

pages = "265--267",

journal = "Vide: Science, Technique et Applications",

issn = "1266-0167",

publisher = "Soci{\'e}t{\'e} Fran{\c c}aise du Vide",

number = "291 SUPPL.2",

}

TY - JOUR

T1 - Growth precursors in a remote silane plasma related to a-Si:

T2 - H film quality

AU - Kessels, W.M.M.

AU - van de Sanden, M.C.M.

AU - Smets, A.H.M.

AU - Korevaar, B.A.

AU - Schram, D.C.

PY - 1999/12/1

Y1 - 1999/12/1

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M3 - Article

AN - SCOPUS:18944369804

SP - 265

EP - 267

JO - Vide: Science, Technique et Applications

JF - Vide: Science, Technique et Applications

SN - 1266-0167

IS - 291 SUPPL.2

ER -