Original language | English |
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Pages (from-to) | 265-267 |
Number of pages | 3 |
Journal | Vide: Science, Technique et Applications |
Issue number | 291 SUPPL.2 |
Publication status | Published - 1 Dec 1999 |
Growth precursors in a remote silane plasma related to a-Si: H film quality
W.M.M. Kessels, M.C.M. van de Sanden, A.H.M. Smets, B.A. Korevaar, D.C. Schram
Research output: Contribution to journal › Article › Academic › peer-review