Growth mechanism of plasma deposited films

W.M.M. Kessels; J.P.M. Hoefnagels; Y. Barrell; P.J. Oever, van den; A.A.E. Stevens; M.C.M. Sanden, van de

Growth mechanism of plasma deposited films

W.M.M. Kessels, J.P.M. Hoefnagels, Y. Barrell, P.J. Oever, van den, A.A.E. Stevens, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the XIVth symposium on Application of Plasma Processes, SAPP XIV : January 13-18, 2003, Liptovský Mikuláš, Slovak Republic
Pages	60-63
Number of pages	4
Publication status	Published - 2003
Event	14th Symposium on Application of Plasma Processes (SAP 2003) - Hotel Jamajka, Liptovský Mikuláš, Slovakia Duration: 13 Jan 2003 → 18 Jan 2003

Conference

Conference	14th Symposium on Application of Plasma Processes (SAP 2003)
Abbreviated title	SAP XIV
Country/Territory	Slovakia
City	Liptovský Mikuláš
Period	13/01/03 → 18/01/03

Cite this

@inproceedings{b992f55b49b142ea9e887a578f04a49b,

title = "Growth mechanism of plasma deposited films",

author = "W.M.M. Kessels and J.P.M. Hoefnagels and Y. Barrell and {Oever, van den}, P.J. and A.A.E. Stevens and {Sanden, van de}, M.C.M.",

year = "2003",

language = "English",

pages = "60--63",

booktitle = "Proceedings of the XIVth symposium on Application of Plasma Processes, SAPP XIV : January 13-18, 2003, Liptovsk{\'y} Mikul{\'a}{\v s}, Slovak Republic",

note = "14th Symposium on Application of Plasma Processes (SAP 2003), SAP XIV ; Conference date: 13-01-2003 Through 18-01-2003",

}

Kessels, WMM , Hoefnagels, JPM, Barrell, Y, Oever, van den, PJ, Stevens, AAE & Sanden, van de, MCM 2003, Growth mechanism of plasma deposited films. in Proceedings of the XIVth symposium on Application of Plasma Processes, SAPP XIV : January 13-18, 2003, Liptovský Mikuláš, Slovak Republic . pp. 60-63, 14th Symposium on Application of Plasma Processes (SAP 2003), Liptovský Mikuláš, Slovakia, 13/01/03.

Growth mechanism of plasma deposited films. / Kessels, W.M.M.; Hoefnagels, J.P.M.; Barrell, Y. et al.
Proceedings of the XIVth symposium on Application of Plasma Processes, SAPP XIV : January 13-18, 2003, Liptovský Mikuláš, Slovak Republic . 2003. p. 60-63.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Growth mechanism of plasma deposited films

AU - Kessels, W.M.M.

AU - Hoefnagels, J.P.M.

AU - Barrell, Y.

AU - Oever, van den, P.J.

AU - Stevens, A.A.E.

AU - Sanden, van de, M.C.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SP - 60

EP - 63

BT - Proceedings of the XIVth symposium on Application of Plasma Processes, SAPP XIV : January 13-18, 2003, Liptovský Mikuláš, Slovak Republic

T2 - 14th Symposium on Application of Plasma Processes (SAP 2003)

Y2 - 13 January 2003 through 18 January 2003

ER -