Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition

N. Leick, R.O.F. Verkuijlen, E. Langereis, F. Roozeboom, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationPhysics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands
EditorsM. Graef, de, G. Zegers, E. Min, F. Pavert, van de
Place of PublicationUtrecht
PublisherStichting FOM
PagesP05.67-204
Publication statusPublished - 2010

Cite this

Leick, N., Verkuijlen, R. O. F., Langereis, E., Roozeboom, F., & Sanden, van de, M. C. M. (2010). Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. In M. Graef, de, G. Zegers, E. Min, & F. Pavert, van de (Eds.), Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands (pp. P05.67-204). Stichting FOM.