Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition

N. Leick, R.O.F. Verkuijlen, E. Langereis, F. Roozeboom, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands
Editors	M. Graef, de, G. Zegers, E. Min, F. Pavert, van de
Place of Publication	Utrecht
Publisher	FOM: Stichting Fundamenteel onderzoek der Materie
Pages	P05.67-204
Publication status	Published - 2010

Cite this

Leick, N., Verkuijlen, R. O. F., Langereis, E., Roozeboom, F., & Sanden, van de, M. C. M. (2010). Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. In M. Graef, de, G. Zegers, E. Min, & F. Pavert, van de (Eds.), Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands (pp. P05.67-204). FOM: Stichting Fundamenteel onderzoek der Materie.

Leick, N. ; Verkuijlen, R.O.F. ; Langereis, E. et al. / Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. editor / M. Graef, de ; G. Zegers ; E. Min ; F. Pavert, van de. Utrecht : FOM: Stichting Fundamenteel onderzoek der Materie, 2010. pp. P05.67-204

@inproceedings{5b7cebd242d74dad98bdf774c6d1fed1,

title = "Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition",

author = "N. Leick and R.O.F. Verkuijlen and E. Langereis and F. Roozeboom and {Sanden, van de}, M.C.M.",

year = "2010",

language = "English",

pages = "P05.67--204",

editor = "{Graef, de}, M. and G. Zegers and E. Min and {Pavert, van de}, F.",

booktitle = "Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands",

publisher = "FOM: Stichting Fundamenteel onderzoek der Materie",

}

Leick, N, Verkuijlen, ROF, Langereis, E, Roozeboom, F & Sanden, van de, MCM 2010, Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. in M Graef, de, G Zegers, E Min & F Pavert, van de (eds), Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. FOM: Stichting Fundamenteel onderzoek der Materie, Utrecht, pp. P05.67-204.

Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. / Leick, N.; Verkuijlen, R.O.F.; Langereis, E. et al.
Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. ed. / M. Graef, de; G. Zegers; E. Min; F. Pavert, van de. Utrecht: FOM: Stichting Fundamenteel onderzoek der Materie, 2010. p. P05.67-204.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition

AU - Leick, N.

AU - Verkuijlen, R.O.F.

AU - Langereis, E.

AU - Roozeboom, F.

AU - Sanden, van de, M.C.M.

PY - 2010

Y1 - 2010

M3 - Conference contribution

SP - P05.67-204

BT - Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands

A2 - Graef, de, M.

A2 - Zegers, G.

A2 - Min, E.

A2 - Pavert, van de, F.

PB - FOM: Stichting Fundamenteel onderzoek der Materie

CY - Utrecht

ER -

Leick N, Verkuijlen ROF, Langereis E, Roozeboom F, Sanden, van de MCM. Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition. In Graef, de M, Zegers G, Min E, Pavert, van de F, editors, Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. Utrecht: FOM: Stichting Fundamenteel onderzoek der Materie. 2010. p. P05.67-204