Global model of microwave induced cylindrical O2/SiCl4 plasma column for SiO2 deposition

Research output: Contribution to conferencePoster

1 Downloads (Pure)

Abstract

No abstract.
Original languageEnglish
Publication statusPublished - 2012
Event15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012) - Conference centre "Rolduc", Kerkrade, Netherlands
Duration: 22 Nov 201223 Nov 2012
https://www.tue.nl/fileadmin/content/faculteiten/tn/PMP/Guidelines__PMP__TuMo_/announcement.pdf

Workshop

Workshop15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012)
Abbreviated titleWELTPP-15
CountryNetherlands
CityKerkrade
Period22/11/1223/11/12
Internet address

Bibliographical note

Poster presented at the 15th workshop on the exploration of low temperature plasma physics (WELTPP 15), 22-23 November 2012, Kerkrade, The Netherlands

Fingerprint Dive into the research topics of 'Global model of microwave induced cylindrical O2/SiCl4 plasma column for SiO2 deposition'. Together they form a unique fingerprint.

Cite this