Giant magnetoresistance and structural study of permalloy/silver multilayers during rapid thermal annealing

F. Roozeboom, I. Gideonse, J.P.W.B. Duchateau, D. G. Neerinck, H. T. Munsters

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)


The Giant Magnetoresistance effect with high field-sensitivity was recently discovered in multilayers of alternating ferromagnetic and non-ferromagnetic layers. Some of these layer structures may find industrial application in miniaturized sensor and high-density digital magnetic recording technologies which require materials with large changes in electrical resistance at low magnetic fields. In this paper we report on Rapid Thermal Annealing experiments done on a series of multilayers of alternating thin permalloy (Ni80Fe20) and silver films. The layers were sputter deposited on thermally oxidized Si (100) substrates. Samples were annealed in nitrogen at temperatures ranging from 280 to 340 °C for 30 seconds to 10 minutes, yielding magnetoresistance data as high as 5% and a maximum field sensitivity of 4.6% per kA·m-1. X-Ray diffraction analysis, showing the gradual formation of an Ag (111) shoulder peak at 2θ = 38.3° upon annealing, supports a recently published hypothesis that the appearance of the GMR effect is anneal-induced by a change of the microstructure due to diffusion, causing notching and disruption of the permalloy layers in the superlattice.

Original languageEnglish
Title of host publication1994 Spring Meeting of the Materials Research Society
Place of PublicationWarrendale
PublisherMaterials Research Society
Number of pages8
Publication statusPublished - 1 Jan 1994
Externally publishedYes
Event1994 Materials Research Society Spring Meeting - San Francisco, CA, USA
Duration: 4 Apr 19947 Apr 1994

Publication series

NameMaterials Research Society Symposium - Proceedings
ISSN (Print)0272-9172


Conference1994 Materials Research Society Spring Meeting
CitySan Francisco, CA, USA


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