Generic framework for photoresist-based metrology calibrations: redesign of calibration component and proof of the new architecture's feasability

S. Strouzas, Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Software Technology (ST)

    Research output: ThesisPd Eng Thesis

    84 Downloads (Pure)

    Abstract

    ASML is a company that designs, develops and produces photolithography machines, called wafer scanners, used in the process of manufacturing chips and integrated circuits. In order to achieve this it requires nanometer accuracy at high speeds. For the nanometer accu-racy to be reached, the system must have a highly accurate calibration system. The calibra-tion is achieved both through hardware and software means. One part of this calibration process is the exposure of a test wafer, readout of the exposure results and adjustment of the machine's parameters. This sequence is executed repeatedly during the calibration phase. Test engineers need to be able to create new calibration tests for this sequence in a conven-ient way. This report describes the proposal for a new architecture of the exposure frame-work used by all the exposure calibration tests. Additionally, the process that drove this project is explained.
    Original languageEnglish
    QualificationDoctor of Philosophy
    Awarding Institution
    Supervisors/Advisors
    • Weffers, Harold T.G., Supervisor
    • Peeters, P.P.A.A., External supervisor
    • Schühmacher, Jelle J.C.P., External supervisor, External person
    • Vazifehdan, Javad, External supervisor, External person
    Award date1 Jan 2013
    Place of PublicationEindhoven
    Publisher
    Print ISBNs978-90-444-1213-0
    Publication statusPublished - 2013

    Bibliographical note

    Eindverslag.

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