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Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices
Y. Jiao, J. Pello, A.J. Millan Mejia, L. Shen, B. Smalbrugge, E.J. Geluk, M.K. Smit, J.J.G.M. Tol, van der
Research output: Contribution to journal › Article › Academic › peer-review
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