Fourth-Order Reference Trajectories in Lithography Stages with Weakly-Damped Modes - a Frequency-Domain Perspective

Marcel Heertjes, Jazmin Zenteno Torres, Mohammad Al Janaideh

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Abstract

The tracking accuracy in motion control systems like the moving stages in lithography machines, e.g., wafer scanners or metrology inspection tools, is partly determined by how the frequency content of its reference trajectories is transferred to the closed-loop tracking error. In this regard, fourth-order reference trajectories for point-to-point motion will be studied from a frequency-domain perspective. By appropriately pairing the maximum snap and maximum jerk values, weakly-damped modes in the closed-loop response can be robustly dealt with without introducing a penalty on throughput.

Original languageEnglish
Title of host publication2023 62nd IEEE Conference on Decision and Control, CDC 2023
PublisherInstitute of Electrical and Electronics Engineers
Pages8696-8701
Number of pages6
ISBN (Electronic)979-8-3503-0124-3
DOIs
Publication statusPublished - 19 Jan 2024
Event62nd IEEE Conference on Decision and Control, CDC 2023 - Singapore, Singapore
Duration: 13 Dec 202315 Dec 2023
Conference number: 62

Conference

Conference62nd IEEE Conference on Decision and Control, CDC 2023
Abbreviated titleCDC 2023
Country/TerritorySingapore
CitySingapore
Period13/12/2315/12/23

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