Formation of large positive silicon-cluster ions in a remote silane plasma

W.M.M. Kessels, C.M. Leewis, A.L.C. Leroux, M.C.M. Sanden, van de, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)
148 Downloads (Pure)
Original languageEnglish
Pages (from-to)1531-1535
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
Volume17
Issue number4
DOIs
Publication statusPublished - 1999

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