Flow and temperature dependence of particle formation in Ar-silane RF capacitively coupled plasmas

In this work we present an overview of our investigations on the particle formation in Silane plasma. We propose a generalized model, based on a simple balance equation, explaining the temperature and flow dependence of the agglomeration time of nano-clusters in Ar-SiH4 plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth.