Abstract
We present recent developments on flexible a-IGZO TFT technology scaling in terms of TFT channel length and operating voltage, as well as manufacturing cost optimization with a focus on R2R processing compatibility. We present progress on the relevant technology building blocks; (i) R2R compatible TFT architecture, (ii) (multilevel) nanoimprint lithography and (iii) S-ALD deposited TFT materials. Additionally, we show a developing application that drives scaling of the technology, namely a monolithically integrated flexible AMOLED display with in-display fingerprint detection.
| Original language | English |
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| Title of host publication | AM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices |
| Subtitle of host publication | TFT Technologies and FPD Materials, Proceedings |
| Place of Publication | Piscataway |
| Publisher | Institute of Electrical and Electronics Engineers |
| Number of pages | 4 |
| ISBN (Print) | 9784990875350 |
| DOIs | |
| Publication status | Published - 2018 |
| Event | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 - Kyoto, Japan Duration: 3 Jul 2018 → 6 Jul 2018 |
Conference
| Conference | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 |
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| Country/Territory | Japan |
| City | Kyoto |
| Period | 3/07/18 → 6/07/18 |
Funding
This work was carried out in the frame of the Holst Centre, a joint collaboration between IMEC and TNO, and financed through the Flexlines project within the Interreg V-programme Flanders-The Netherlands, a cross-border cooperation programme with financial support from the European Regional Development Fund. We gratefully thank Fred Roozeboom and Andrea Illiberi with regards to the S-ALD work and the process engineers of Holst Centre’s GEN1 TFT Pilot Line in Eindhoven, the Netherlands, for fabrication of the transistors and TFT backplanes.