First results from the large dynamic range atomic force microscope for overlay metrology

G. Witvoet, J. Peters, S. Kuiper, S. Keyvani, R. Willekers

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

TNO is developing a novel Large Dynamic Range Atomic Force Microscope (LDR-AFM), primarily but not exclusively designed for sub-nm accurate overlay metrology. The LDR-AFM combines an AFM with a 6 degrees- of-freedom interferometric positioning stage, thereby enabling measurements of sub-nm features on a wafer over multiple millimeters marker-to-feature distances. The current work provides an overview of recent developments and presents the first results obtained after final integration of the complete system. This includes results on the AFM head development, the validated positioning stage performance, the first AFM images, and long-term stability measurements.

LanguageEnglish
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXXIII
EditorsVladimir A. Ukraintsev, Ofer Adan
Place of PublicationBellingham
PublisherSPIE
Number of pages10
ISBN (Electronic)9781510625655
DOIs
StatePublished - 26 Mar 2019
EventMetrology, Inspection, and Process Control for Microlithography XXXIII 2019 - San Jose, United States
Duration: 25 Feb 201928 Feb 2019

Publication series

NameProceedings of SPIE
Volume10959

Conference

ConferenceMetrology, Inspection, and Process Control for Microlithography XXXIII 2019
CountryUnited States
CitySan Jose
Period25/02/1928/02/19

Fingerprint

Atomic Force Microscope
Dynamic Range
Metrology
Overlay
metrology
Positioning
dynamic range
Microscopes
microscopes
atomic force microscopy
positioning
Wafer
trans-Neptunian objects
Degree of freedom
Degrees of freedom (mechanics)
markers
degrees of freedom
wafers

Keywords

  • AFM
  • Control
  • Identification
  • Metrology
  • Overlay
  • Positioning

Cite this

Witvoet, G., Peters, J., Kuiper, S., Keyvani, S., & Willekers, R. (2019). First results from the large dynamic range atomic force microscope for overlay metrology. In V. A. Ukraintsev, & O. Adan (Eds.), Metrology, Inspection, and Process Control for Microlithography XXXIII [109592E] (Proceedings of SPIE; Vol. 10959). Bellingham: SPIE. DOI: 10.1117/12.2514044
Witvoet, G. ; Peters, J. ; Kuiper, S. ; Keyvani, S. ; Willekers, R./ First results from the large dynamic range atomic force microscope for overlay metrology. Metrology, Inspection, and Process Control for Microlithography XXXIII. editor / Vladimir A. Ukraintsev ; Ofer Adan. Bellingham : SPIE, 2019. (Proceedings of SPIE).
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Witvoet, G, Peters, J, Kuiper, S, Keyvani, S & Willekers, R 2019, First results from the large dynamic range atomic force microscope for overlay metrology. in VA Ukraintsev & O Adan (eds), Metrology, Inspection, and Process Control for Microlithography XXXIII., 109592E, Proceedings of SPIE, vol. 10959, SPIE, Bellingham, Metrology, Inspection, and Process Control for Microlithography XXXIII 2019, San Jose, United States, 25/02/19. DOI: 10.1117/12.2514044

First results from the large dynamic range atomic force microscope for overlay metrology. / Witvoet, G.; Peters, J.; Kuiper, S.; Keyvani, S.; Willekers, R.

Metrology, Inspection, and Process Control for Microlithography XXXIII. ed. / Vladimir A. Ukraintsev; Ofer Adan. Bellingham : SPIE, 2019. 109592E (Proceedings of SPIE; Vol. 10959).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Witvoet G, Peters J, Kuiper S, Keyvani S, Willekers R. First results from the large dynamic range atomic force microscope for overlay metrology. In Ukraintsev VA, Adan O, editors, Metrology, Inspection, and Process Control for Microlithography XXXIII. Bellingham: SPIE. 2019. 109592E. (Proceedings of SPIE). Available from, DOI: 10.1117/12.2514044