First performance results of the ASML alplia demo tool

Hans Meiling, Henk Meijer, Vadim Banine, Roel Moors, Regier Groeneveld, Harm Jan Voorma, Uwe Mickan, Bas Wolschrijn, Bas Mertens, Gregor van Baars, Peter Kürz, Noreen Harned

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

78 Citations (Scopus)

Abstract

The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies X
EditorsM. Lercel
PublisherSPIE
Number of pages12
ISBN (Print)0819461946, 9780819461940
DOIs
Publication statusPublished - 10 Jul 2006
Externally publishedYes
EventEmerging Lithographic Technologies X - San Jose, CA, United States
Duration: 21 Jan 200623 Jan 2006

Publication series

NameProceedings of SPIE
Volume6151

Conference

ConferenceEmerging Lithographic Technologies X
CountryUnited States
CitySan Jose, CA
Period21/01/0623/01/06

Fingerprint

Contamination
Optics
contamination
optics
Cleaning
half spaces
Lithography
Resist
Development Process
Half-space
accumulators
cleaning
Half line
Vacuum
Degradation
lithography
degradation
costs
vacuum
Costs

Cite this

Meiling, H., Meijer, H., Banine, V., Moors, R., Groeneveld, R., Voorma, H. J., ... Harned, N. (2006). First performance results of the ASML alplia demo tool. In M. Lercel (Ed.), Emerging Lithographic Technologies X [615108] (Proceedings of SPIE; Vol. 6151). SPIE. https://doi.org/10.1117/12.657348
Meiling, Hans ; Meijer, Henk ; Banine, Vadim ; Moors, Roel ; Groeneveld, Regier ; Voorma, Harm Jan ; Mickan, Uwe ; Wolschrijn, Bas ; Mertens, Bas ; van Baars, Gregor ; Kürz, Peter ; Harned, Noreen. / First performance results of the ASML alplia demo tool. Emerging Lithographic Technologies X. editor / M. Lercel. SPIE, 2006. (Proceedings of SPIE).
@inproceedings{1fa7906f911640308b91db1cc1cf4193,
title = "First performance results of the ASML alplia demo tool",
abstract = "The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.",
author = "Hans Meiling and Henk Meijer and Vadim Banine and Roel Moors and Regier Groeneveld and Voorma, {Harm Jan} and Uwe Mickan and Bas Wolschrijn and Bas Mertens and {van Baars}, Gregor and Peter K{\"u}rz and Noreen Harned",
year = "2006",
month = "7",
day = "10",
doi = "10.1117/12.657348",
language = "English",
isbn = "0819461946",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "M. Lercel",
booktitle = "Emerging Lithographic Technologies X",
address = "United States",

}

Meiling, H, Meijer, H, Banine, V, Moors, R, Groeneveld, R, Voorma, HJ, Mickan, U, Wolschrijn, B, Mertens, B, van Baars, G, Kürz, P & Harned, N 2006, First performance results of the ASML alplia demo tool. in M Lercel (ed.), Emerging Lithographic Technologies X., 615108, Proceedings of SPIE, vol. 6151, SPIE, Emerging Lithographic Technologies X, San Jose, CA, United States, 21/01/06. https://doi.org/10.1117/12.657348

First performance results of the ASML alplia demo tool. / Meiling, Hans; Meijer, Henk; Banine, Vadim; Moors, Roel; Groeneveld, Regier; Voorma, Harm Jan; Mickan, Uwe; Wolschrijn, Bas; Mertens, Bas; van Baars, Gregor; Kürz, Peter; Harned, Noreen.

Emerging Lithographic Technologies X. ed. / M. Lercel. SPIE, 2006. 615108 (Proceedings of SPIE; Vol. 6151).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - First performance results of the ASML alplia demo tool

AU - Meiling, Hans

AU - Meijer, Henk

AU - Banine, Vadim

AU - Moors, Roel

AU - Groeneveld, Regier

AU - Voorma, Harm Jan

AU - Mickan, Uwe

AU - Wolschrijn, Bas

AU - Mertens, Bas

AU - van Baars, Gregor

AU - Kürz, Peter

AU - Harned, Noreen

PY - 2006/7/10

Y1 - 2006/7/10

N2 - The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

AB - The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

UR - http://www.scopus.com/inward/record.url?scp=33745628745&partnerID=8YFLogxK

U2 - 10.1117/12.657348

DO - 10.1117/12.657348

M3 - Conference contribution

AN - SCOPUS:33745628745

SN - 0819461946

SN - 9780819461940

T3 - Proceedings of SPIE

BT - Emerging Lithographic Technologies X

A2 - Lercel, M.

PB - SPIE

ER -

Meiling H, Meijer H, Banine V, Moors R, Groeneveld R, Voorma HJ et al. First performance results of the ASML alplia demo tool. In Lercel M, editor, Emerging Lithographic Technologies X. SPIE. 2006. 615108. (Proceedings of SPIE). https://doi.org/10.1117/12.657348