First performance results of the ASML alplia demo tool

Hans Meiling, Henk Meijer, Vadim Banine, Roel Moors, Regier Groeneveld, Harm Jan Voorma, Uwe Mickan, Bas Wolschrijn, Bas Mertens, Gregor van Baars, Peter Kürz, Noreen Harned

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

80 Citations (Scopus)

Abstract

The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies X
EditorsM. Lercel
PublisherSPIE
Number of pages12
ISBN (Print)0819461946, 9780819461940
DOIs
Publication statusPublished - 10 Jul 2006
Externally publishedYes
EventEmerging Lithographic Technologies X - San Jose, CA, United States
Duration: 21 Jan 200623 Jan 2006

Publication series

NameProceedings of SPIE
Volume6151

Conference

ConferenceEmerging Lithographic Technologies X
CountryUnited States
CitySan Jose, CA
Period21/01/0623/01/06

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