Film microstructure control and characterization of plasma-deposited Si02-like films by means of ellipsometric porosimetry

G. Aresta, N.M. Terlinden, M. Creatore, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts)
Place of PublicationS.l.
Publishers.n.
Pages479-479
Publication statusPublished - 2008
Event11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008) - Garmisch-Partenkirchen, Germany
Duration: 15 Sep 200819 Sep 2008

Conference

Conference11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008)
CountryGermany
CityGarmisch-Partenkirchen
Period15/09/0819/09/08

Cite this

Aresta, G., Terlinden, N. M., Creatore, M., & Sanden, van de, M. C. M. (2008). Film microstructure control and characterization of plasma-deposited Si02-like films by means of ellipsometric porosimetry. In Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts) (pp. 479-479). s.n..