Film conformality and extracted recombination probabilities of O atoms during plasma-assisted atomic layer deposition of SiO2, TiO2, Al2O3, and HfO2

Karsten Arts, Mikko Utriainen, R.L. Puurunen, Erwin Kessels (Corresponding author), Harm Knoops (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

28 Citations (Scopus)
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