(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

J.J. Beulens; A.J.M. Buuron; G.J. Meeusen; M.C.M. Sanden, van de; D.C. Schram

(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

J.J. Beulens, A.J.M. Buuron, G.J. Meeusen, M.C.M. Sanden, van de, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]

Original language	English
Title of host publication	Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992
Editors	G. Bonizzoni, W. Hooke, E. Sindoni
Place of Publication	Bologna
Publisher	Compositori
Pages	391-404
ISBN (Print)	88-7794-050-6
Publication status	Published - 1993

Cite this

Beulens, J. J., Buuron, A. J. M., Meeusen, G. J., Sanden, van de, M. C. M., & Schram, D. C. (1993). (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. In G. Bonizzoni, W. Hooke, & E. Sindoni (Eds.), Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992 (pp. 391-404). Compositori.

Beulens, J.J. ; Buuron, A.J.M. ; Meeusen, G.J. et al. / (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992. editor / G. Bonizzoni ; W. Hooke ; E. Sindoni. Bologna : Compositori, 1993. pp. 391-404

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title = "(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms",

abstract = "A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]",

author = "J.J. Beulens and A.J.M. Buuron and G.J. Meeusen and {Sanden, van de}, M.C.M. and D.C. Schram",

year = "1993",

language = "English",

isbn = "88-7794-050-6",

pages = "391--404",

editor = "G. Bonizzoni and W. Hooke and E. Sindoni",

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Beulens, JJ, Buuron, AJM, Meeusen, GJ, Sanden, van de, MCM & Schram, DC 1993, (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. in G Bonizzoni, W Hooke & E Sindoni (eds), Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992. Compositori, Bologna, pp. 391-404.

(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. / Beulens, J.J.; Buuron, A.J.M.; Meeusen, G.J. et al.

Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992. ed. / G. Bonizzoni; W. Hooke; E. Sindoni. Bologna : Compositori, 1993. p. 391-404.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

AU - Beulens, J.J.

AU - Buuron, A.J.M.

AU - Meeusen, G.J.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1993

Y1 - 1993

N2 - A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]

AB - A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]

M3 - Conference contribution

SN - 88-7794-050-6

SP - 391

EP - 404

BT - Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992

A2 - Bonizzoni, G.

A2 - Hooke, W.

A2 - Sindoni, E.

PB - Compositori

CY - Bologna

ER -

Beulens JJ, Buuron AJM, Meeusen GJ, Sanden, van de MCM , Schram DC. (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. In Bonizzoni G, Hooke W, Sindoni E, editors, Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992. Bologna: Compositori. 1993. p. 391-404

(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

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