(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms

J.J. Beulens, A.J.M. Buuron, G.J. Meeusen, M.C.M. Sanden, van de, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)

Abstract

A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]
Original languageEnglish
Title of host publicationIndustrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992
EditorsG. Bonizzoni, W. Hooke, E. Sindoni
Place of PublicationBologna
PublisherCompositori
Pages391-404
ISBN (Print)88-7794-050-6
Publication statusPublished - 1993

Fingerprint Dive into the research topics of '(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms'. Together they form a unique fingerprint.

  • Cite this

    Beulens, J. J., Buuron, A. J. M., Meeusen, G. J., Sanden, van de, M. C. M., & Schram, D. C. (1993). (Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms. In G. Bonizzoni, W. Hooke, & E. Sindoni (Eds.), Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero - Varenna, Italy, 2-11 September 1992 (pp. 391-404). Compositori.