Fast model predictive control of power amplifiers for nanometer precision motion systems

Duo Xu; Mircea Lazar

doi:10.23919/ECC57647.2023.10178259

Fast model predictive control of power amplifiers for nanometer precision motion systems

Duo Xu, Mircea Lazar

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

This paper deals with the design of a fast MPC algorithm for the current control of a power amplifier utilized for nanometer precision positioning systems within lithography machines. In order to achieve nanometer precision positioning, the internal power amplifier must accurately track a current reference in a very short time (tens of microseconds). Classical industrial control solutions based on transfer functions do not take duty-cycle limits into account and suffer from limited bandwidth, which in turn limits the achievable positioning precision. We design a fast gradient based MPC algorithm that can accurately track the dynamic current reference while satisfying constraints. Simulations show that the MPC-controlled amplifier results in at least 2x better nanometer positioning precision for specific metrics employed in the lithography industry, compared to an industrial loop-shaping controller and an LQR controller.

Original language	English
Title of host publication	2023 European Control Conference, ECC 2023
Publisher	Institute of Electrical and Electronics Engineers
Pages	1-7
Number of pages	7
ISBN (Electronic)	978-3-907144-08-4
DOIs	https://doi.org/10.23919/ECC57647.2023.10178259
Publication status	Published - 17 Jul 2023
Event	2023 European Control Conference, ECC 2023 - Bucharest, Romania Duration: 14 Jun 2023 → 16 Jun 2023 https://ecc23.euca-ecc.org/

Conference

Conference	2023 European Control Conference, ECC 2023
Abbreviated title	ECC 2023
Country/Territory	Romania
City	Bucharest
Period	14/06/23 → 16/06/23
Internet address	https://ecc23.euca-ecc.org/

Funding

This work is funded by the EU Horizon 2020 research project IT2 (IC Technology for the 2nm Node), Grant agreement ID: 875999. All authors are with the Control Systems Group, Department of Electrical Engineering, Eindhoven University of Technology, The Netherlands. E-mails: [email protected], [email protected].

Funders	Funder number
European Union's Horizon 2020 - Research and Innovation Framework Programme	875999

Keywords

Constrained control
Fast gradient methods
Model predictive control
Motion control
Power amplifiers

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10.23919/ECC57647.2023.10178259

pdfFinal published version, 1.16 MBLicence: TAVERNE

Cite this

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abstract = "This paper deals with the design of a fast MPC algorithm for the current control of a power amplifier utilized for nanometer precision positioning systems within lithography machines. In order to achieve nanometer precision positioning, the internal power amplifier must accurately track a current reference in a very short time (tens of microseconds). Classical industrial control solutions based on transfer functions do not take duty-cycle limits into account and suffer from limited bandwidth, which in turn limits the achievable positioning precision. We design a fast gradient based MPC algorithm that can accurately track the dynamic current reference while satisfying constraints. Simulations show that the MPC-controlled amplifier results in at least 2x better nanometer positioning precision for specific metrics employed in the lithography industry, compared to an industrial loop-shaping controller and an LQR controller.",

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AB - This paper deals with the design of a fast MPC algorithm for the current control of a power amplifier utilized for nanometer precision positioning systems within lithography machines. In order to achieve nanometer precision positioning, the internal power amplifier must accurately track a current reference in a very short time (tens of microseconds). Classical industrial control solutions based on transfer functions do not take duty-cycle limits into account and suffer from limited bandwidth, which in turn limits the achievable positioning precision. We design a fast gradient based MPC algorithm that can accurately track the dynamic current reference while satisfying constraints. Simulations show that the MPC-controlled amplifier results in at least 2x better nanometer positioning precision for specific metrics employed in the lithography industry, compared to an industrial loop-shaping controller and an LQR controller.

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Fast model predictive control of power amplifiers for nanometer precision motion systems

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