Fast isotropic etching of photoresist and silicon using an expanding thermal plasma

M.C.M. Sanden, van de, O. Straaten, van der, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Original languageEnglish
Title of host publicationAVS, American Vacuum Society : 44th national symposium, San Jose, October 20-24, 1997 : Abstracts
Publication statusPublished - 1997

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