Fast isotropic etching of photoresist and silicon using an expanding thermal plasma

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Original language	English
Title of host publication	AVS, American Vacuum Society : 44th national symposium, San Jose, October 20-24, 1997 : Abstracts
Pages	73
Publication status	Published - 1997

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@inproceedings{fefa07a5363c4c148c6bf25d5dae9d69,

title = "Fast isotropic etching of photoresist and silicon using an expanding thermal plasma",

author = "{Sanden, van de}, M.C.M. and {Straaten, van der}, O. and D.C. Schram",

year = "1997",

language = "English",

pages = "73",

booktitle = "AVS, American Vacuum Society : 44th national symposium, San Jose, October 20-24, 1997 : Abstracts",

}