Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers

J.W.A.M. Gielen; R.J. Severens; W.M.M. Kessels; M.C.M. Sanden, van de; D.C. Schram

Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers

J.W.A.M. Gielen
, R.J. Severens
, W.M.M. Kessels
, M.C.M. Sanden, van de
, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4
Editors	K. Tachibana, Y. Watanabe
Place of Publication	S.n.
Publisher	s.n.
Pages	51-52
Publication status	Published - 1997
Event	3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, ICRP-3/SPP-14 - Nara, Japan Duration: 21 Jan 1997 → 24 Jan 1997

Conference

Conference	3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, ICRP-3/SPP-14
Country/Territory	Japan
City	Nara
Period	21/01/97 → 24/01/97

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592202Final published version, 197 KB

Cite this

Gielen, J. W. A. M., Severens, R. J., Kessels, W. M. M., Sanden, van de, M. C. M., & Schram, D. C. (1997). Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers. In K. Tachibana, & Y. Watanabe (Eds.), Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4 (pp. 51-52). s.n..

Gielen, J.W.A.M. ; Severens, R.J. ; Kessels, W.M.M. et al. / Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers. Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4. editor / K. Tachibana ; Y. Watanabe. S.n. : s.n., 1997. pp. 51-52

@inproceedings{d8447b0c3a944b5bb84b355b8f0663e9,

title = "Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers",

author = "J.W.A.M. Gielen and R.J. Severens and W.M.M. Kessels and \{Sanden, van de\}, M.C.M. and D.C. Schram",

year = "1997",

language = "English",

pages = "51--52",

editor = "K. Tachibana and Y. Watanabe",

booktitle = "Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4",

publisher = "s.n.",

note = "3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, ICRP-3/SPP-14 ; Conference date: 21-01-1997 Through 24-01-1997",

}

Gielen, JWAM, Severens, RJ, Kessels, WMM , Sanden, van de, MCM & Schram, DC 1997, Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers. in K Tachibana & Y Watanabe (eds), Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4. s.n., S.n., pp. 51-52, 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, ICRP-3/SPP-14, Nara, Japan, 21/01/97.

Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers. / Gielen, J.W.A.M.; Severens, R.J.; Kessels, W.M.M. et al.
Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4. ed. / K. Tachibana; Y. Watanabe. S.n.: s.n., 1997. p. 51-52.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers

AU - Gielen, J.W.A.M.

AU - Severens, R.J.

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SP - 51

EP - 52

BT - Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4

A2 - Tachibana, K.

A2 - Watanabe, Y.

PB - s.n.

CY - S.n.

T2 - 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, ICRP-3/SPP-14

Y2 - 21 January 1997 through 24 January 1997

ER -

Gielen JWAM, Severens RJ, Kessels WMM , Sanden, van de MCM , Schram DC. Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers. In Tachibana K, Watanabe Y, editors, Proceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4. S.n.: s.n. 1997. p. 51-52