Fast deposition of thin layers of amorphous hydrogenated carbon and silicon layers

J.W.A.M. Gielen, R.J. Severens, W.M.M. Kessels, M.C.M. Sanden, van de, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

39 Downloads (Pure)
Original languageEnglish
Title of host publicationProceedigns of the ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan, vol. 4
EditorsK. Tachibana, Y. Watanabe
Place of PublicationS.n.
Publishers.n.
Pages51-52
Publication statusPublished - 1997
Eventconference; ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan; 1997-01-21; 1997-01-24 -
Duration: 21 Jan 199724 Jan 1997

Conference

Conferenceconference; ICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan; 1997-01-21; 1997-01-24
Period21/01/9724/01/97
OtherICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, January 21-24, 1997, Nara, Japan

Cite this