Original language | English |
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Title of host publication | Progress in Plasma Processing of Materials 1999, Proceedings of the 5th International Thermal Plasma Processesing Conference, St. Petersburg, Russia, |
Editors | P. Fauchais, J. Amouroux |
Place of Publication | New York |
Publisher | Begell House Inc. |
Pages | 869-875 |
ISBN (Print) | 1-56700-126-2 |
Publication status | Published - 1999 |
Fast deposition of device quality hydrogenated amorphous silicon by an expanding thermal plasma
W.M.M. Kessels, M.C.M. Sanden, van de, R.J. Severens, D.C. Schram
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic