Fast deposition of device quality hydrogenated amorphous silicon by an expanding thermal plasma

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationProgress in Plasma Processing of Materials 1999, Proceedings of the 5th International Thermal Plasma Processesing Conference, St. Petersburg, Russia,
EditorsP. Fauchais, J. Amouroux
Place of PublicationNew York
PublisherBegell House Inc.
Pages869-875
ISBN (Print)1-56700-126-2
Publication statusPublished - 1999

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