Fast deposition of carbon and silicon layers

J.J. Beulens; A.J.M. Buuron; M.J. Graaf, de; G.J. Meeusen; M.C.M. Sanden, van de; A.T.M. Wilbers; D.C. Schram

Fast deposition of carbon and silicon layers

J.J. Beulens
, A.J.M. Buuron
, M.J. Graaf, de
, G.J. Meeusen
, M.C.M. Sanden, van de
, A.T.M. Wilbers
, D.C. Schram

Plasma & Materials Processing

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

A review with 26 refs. on plasma CVD of a-Si:H and a-C:H. [on SciFinder (R)]

Original language	English
Pages (from-to)	105-127
Journal	Journal of High Temperature Chemical Processes
Volume	1
Issue number	1
Publication status	Published - 1992

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@article{1a2987b8513d4c5481c14062e6422223,

title = "Fast deposition of carbon and silicon layers",

abstract = "A review with 26 refs. on plasma CVD of a-Si:H and a-C:H. [on SciFinder (R)]",

author = "J.J. Beulens and A.J.M. Buuron and \{Graaf, de\}, M.J. and G.J. Meeusen and \{Sanden, van de\}, M.C.M. and A.T.M. Wilbers and D.C. Schram",

year = "1992",

language = "English",

volume = "1",

pages = "105--127",

journal = "Journal of High Temperature Chemical Processes",

issn = "1240-4292",

number = "1",

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TY - JOUR

T1 - Fast deposition of carbon and silicon layers

AU - Beulens, J.J.

AU - Buuron, A.J.M.

AU - Graaf, de, M.J.

AU - Meeusen, G.J.

AU - Sanden, van de, M.C.M.

AU - Wilbers, A.T.M.

AU - Schram, D.C.

PY - 1992

Y1 - 1992

N2 - A review with 26 refs. on plasma CVD of a-Si:H and a-C:H. [on SciFinder (R)]

AB - A review with 26 refs. on plasma CVD of a-Si:H and a-C:H. [on SciFinder (R)]

M3 - Article

SN - 1240-4292

VL - 1

SP - 105

EP - 127

JO - Journal of High Temperature Chemical Processes

JF - Journal of High Temperature Chemical Processes

IS - 1

ER -

Fast deposition of carbon and silicon layers

Abstract

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