Fast deposition of carbon and silicon layers

J.J. Beulens, A.J.M. Buuron, M.J. Graaf, de, G.J. Meeusen, M.C.M. Sanden, van de, A.T.M. Wilbers, D.C. Schram

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Abstract

A review with 26 refs. on plasma CVD of a-Si:H and a-C:H. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)105-127
JournalJournal of High Temperature Chemical Processes
Volume1
Issue number1
Publication statusPublished - 1992

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    Beulens, J. J., Buuron, A. J. M., Graaf, de, M. J., Meeusen, G. J., Sanden, van de, M. C. M., Wilbers, A. T. M., & Schram, D. C. (1992). Fast deposition of carbon and silicon layers. Journal of High Temperature Chemical Processes, 1(1), 105-127.