Fast deposition of amorphous hydrogenated carbon and silicon layers

A.J.M. Buuron, J.J. Beulens, G.J. Meeusen, M.C.M. Sanden, van de, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)
32 Downloads (Pure)


The dependencies of particle and power fluxed were investigated on the parameters of the deposition process and the relation with the quality of the deposited amorphous hydrogenated carbon layers. The deposition rate for a-C:H films increases as a function of monomer flow rate, Ar flow rate, and arc power. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)115-121
JournalJournal of Applied Polymer Science: Applied Polymer Symposium
Issue numberPlasma Dep
Publication statusPublished - 1994


Dive into the research topics of 'Fast deposition of amorphous hydrogenated carbon and silicon layers'. Together they form a unique fingerprint.

Cite this