TY - JOUR
T1 - Fast deposition of amorphous hydrogenated carbon and silicon layers
AU - Buuron, A.J.M.
AU - Beulens, J.J.
AU - Meeusen, G.J.
AU - Sanden, van de, M.C.M.
AU - Schram, D.C.
PY - 1994
Y1 - 1994
N2 - The dependencies of particle and power fluxed were investigated on the parameters of the deposition process and the relation with the quality of the deposited amorphous hydrogenated carbon layers. The deposition rate for a-C:H films increases as a function of monomer flow rate, Ar flow rate, and arc power. [on SciFinder (R)]
AB - The dependencies of particle and power fluxed were investigated on the parameters of the deposition process and the relation with the quality of the deposited amorphous hydrogenated carbon layers. The deposition rate for a-C:H films increases as a function of monomer flow rate, Ar flow rate, and arc power. [on SciFinder (R)]
M3 - Article
SN - 0271-9460
VL - 54
SP - 115
EP - 121
JO - Journal of Applied Polymer Science: Applied Polymer Symposium
JF - Journal of Applied Polymer Science: Applied Polymer Symposium
IS - Plasma Dep
ER -