Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma

Research output: Contribution to conferencePosterAcademic

Original languageEnglish
Publication statusPublished - 1992
EventGordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA - New London, NH, United States
Duration: 10 Aug 199214 Aug 1992

Conference

ConferenceGordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA
CountryUnited States
CityNew London, NH
Period10/08/9214/08/92

Bibliographical note

Proceedings of the Gordon Conference on Plasma Chemistry, New London, USA, 10-14 August 1992

Cite this

Meeusen, G. J., Sanden, van de, M. C. M., & Schram, D. C. (1992). Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma. Poster session presented at Gordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA, New London, NH, United States.