Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma

G.J. Meeusen; M.C.M. Sanden, van de; D.C. Schram

Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma

G.J. Meeusen, M.C.M. Sanden, van de, D.C. Schram

Plasma & Materials Processing

Research output: Contribution to conference › Poster

Original language	English
Publication status	Published - 1992
Event	Gordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA - New London, NH, United States Duration: 10 Aug 1992 → 14 Aug 1992

Conference

Conference	Gordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA
Country/Territory	United States
City	New London, NH
Period	10/08/92 → 14/08/92

Bibliographical note

Proceedings of the Gordon Conference on Plasma Chemistry, New London, USA, 10-14 August 1992

Cite this

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title = "Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma",

author = "G.J. Meeusen and {Sanden, van de}, M.C.M. and D.C. Schram",

note = "Proceedings of the Gordon Conference on Plasma Chemistry, New London, USA, 10-14 August 1992; Gordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA ; Conference date: 10-08-1992 Through 14-08-1992",

year = "1992",

language = "English",

}

TY - CONF

T1 - Fast deposition of a-Si:H using and expanding Ar/H2 cascaded plasma

AU - Meeusen, G.J.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

N1 - Proceedings of the Gordon Conference on Plasma Chemistry, New London, USA, 10-14 August 1992

PY - 1992

Y1 - 1992

M3 - Poster

T2 - Gordon Conference on Plasma Chemistry, August 10-14, 1992, New London, NH, USA

Y2 - 10 August 1992 through 14 August 1992

ER -