Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon

V.M. Dolores Calzadilla; C.T.T. Geluk; T. Vries, de; B. Smalbrugge; P.J. Veldhoven, van; H.P.M.M. Ambrosius; D. Heiss; A. Fiore; M.K. Smit

Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon

V.M. Dolores Calzadilla, C.T.T. Geluk, T. Vries, de, B. Smalbrugge, P.J. Veldhoven, van, H.P.M.M. Ambrosius, D. Heiss, A. Fiore, M.K. Smit

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

81 Downloads (Pure)

Abstract

Electrically pumped metal-cavity nanolasers in III-V semiconductors are promising for their application in optical interconnects, where high integration density and low optical powers are required. They offer a low threshold current and excellent cooling properties due to the metal encapsulation. In this contribution, an overview about the technology required for the fabrication of a nanolaser coupled to an InP-membrane waveguide on silicon is presented. A variety of techniques are used including electron-beam lithography, dry and wet etching, as well as deposition of dielectrics and metals. The technological challenges to fabricate such a complex nanostructure are also discussed.

Original language	English
Title of host publication	Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
Pages	243-246
ISBN (Print)	978-90-386-3512-5
Publication status	Published - 2013
Event	18th Annual Symposium of the IEEE Photonics Benelux Chapter - Eindhoven, Netherlands Duration: 25 Nov 2013 → 26 Nov 2013 http://www.photonics-benelux.org/symp13/

Conference

Conference	18th Annual Symposium of the IEEE Photonics Benelux Chapter
Country/Territory	Netherlands
City	Eindhoven
Period	25/11/13 → 26/11/13
Internet address	http://www.photonics-benelux.org/symp13/

Access to Document

1463463219664449Final author version , 762 KB

Cite this

Dolores Calzadilla, V. M., Geluk, C. T. T., Vries, de, T., Smalbrugge, B., Veldhoven, van, P. J., Ambrosius, H. P. M. M., Heiss, D., Fiore, A., & Smit, M. K. (2013). Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon. In Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands (pp. 243-246). Technische Universiteit Eindhoven.

Dolores Calzadilla, V.M. ; Geluk, C.T.T. ; Vries, de, T. ; Smalbrugge, B. ; Veldhoven, van, P.J. ; Ambrosius, H.P.M.M. ; Heiss, D. ; Fiore, A. ; Smit, M.K. / Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon. Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands. Eindhoven : Technische Universiteit Eindhoven, 2013. pp. 243-246

@inproceedings{9ada8e8b558c4dfbb5ed9375dde1efa0,

title = "Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon",

abstract = "Electrically pumped metal-cavity nanolasers in III-V semiconductors are promising for their application in optical interconnects, where high integration density and low optical powers are required. They offer a low threshold current and excellent cooling properties due to the metal encapsulation. In this contribution, an overview about the technology required for the fabrication of a nanolaser coupled to an InP-membrane waveguide on silicon is presented. A variety of techniques are used including electron-beam lithography, dry and wet etching, as well as deposition of dielectrics and metals. The technological challenges to fabricate such a complex nanostructure are also discussed.",

author = "{Dolores Calzadilla}, V.M. and C.T.T. Geluk and {Vries, de}, T. and B. Smalbrugge and {Veldhoven, van}, P.J. and H.P.M.M. Ambrosius and D. Heiss and A. Fiore and M.K. Smit",

year = "2013",

language = "English",

isbn = "978-90-386-3512-5",

pages = "243--246",

booktitle = "Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands",

publisher = "Technische Universiteit Eindhoven",

note = "18th Annual Symposium of the IEEE Photonics Benelux Chapter ; Conference date: 25-11-2013 Through 26-11-2013",

url = "http://www.photonics-benelux.org/symp13/",

}

Dolores Calzadilla, VM, Geluk, CTT, Vries, de, T, Smalbrugge, B, Veldhoven, van, PJ, Ambrosius, HPMM, Heiss, D, Fiore, A & Smit, MK 2013, Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon. in Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands. Technische Universiteit Eindhoven, Eindhoven, pp. 243-246, 18th Annual Symposium of the IEEE Photonics Benelux Chapter, Eindhoven, Netherlands, 25/11/13.

Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon. / Dolores Calzadilla, V.M.; Geluk, C.T.T.; Vries, de, T.; Smalbrugge, B.; Veldhoven, van, P.J.; Ambrosius, H.P.M.M.; Heiss, D.; Fiore, A.; Smit, M.K.

Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands. Eindhoven : Technische Universiteit Eindhoven, 2013. p. 243-246.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon

AU - Dolores Calzadilla, V.M.

AU - Geluk, C.T.T.

AU - Vries, de, T.

AU - Smalbrugge, B.

AU - Veldhoven, van, P.J.

AU - Ambrosius, H.P.M.M.

AU - Heiss, D.

AU - Fiore, A.

AU - Smit, M.K.

PY - 2013

Y1 - 2013

N2 - Electrically pumped metal-cavity nanolasers in III-V semiconductors are promising for their application in optical interconnects, where high integration density and low optical powers are required. They offer a low threshold current and excellent cooling properties due to the metal encapsulation. In this contribution, an overview about the technology required for the fabrication of a nanolaser coupled to an InP-membrane waveguide on silicon is presented. A variety of techniques are used including electron-beam lithography, dry and wet etching, as well as deposition of dielectrics and metals. The technological challenges to fabricate such a complex nanostructure are also discussed.

AB - Electrically pumped metal-cavity nanolasers in III-V semiconductors are promising for their application in optical interconnects, where high integration density and low optical powers are required. They offer a low threshold current and excellent cooling properties due to the metal encapsulation. In this contribution, an overview about the technology required for the fabrication of a nanolaser coupled to an InP-membrane waveguide on silicon is presented. A variety of techniques are used including electron-beam lithography, dry and wet etching, as well as deposition of dielectrics and metals. The technological challenges to fabricate such a complex nanostructure are also discussed.

M3 - Conference contribution

SN - 978-90-386-3512-5

SP - 243

EP - 246

BT - Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands

PB - Technische Universiteit Eindhoven

CY - Eindhoven

T2 - 18th Annual Symposium of the IEEE Photonics Benelux Chapter

Y2 - 25 November 2013 through 26 November 2013

ER -

Dolores Calzadilla VM, Geluk CTT, Vries, de T, Smalbrugge B, Veldhoven, van PJ, Ambrosius HPMM et al. Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon. In Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Eindhoven, The Netherlands. Eindhoven: Technische Universiteit Eindhoven. 2013. p. 243-246

Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon

Abstract

Conference

Access to Document

Fingerprint

Cite this