Abstract
In this letter, the fabrication and the characterization of angled and straight etched facets in InP-based technology are reported. In addition, we report on etched facets combined with coupler mirrors for vertical outcoupling, realized with a wet-etching process.
Original language | English |
---|---|
Pages (from-to) | 245-247 |
Journal | IEEE Photonics Technology Letters |
Volume | 28 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1 Feb 2016 |
Keywords
- Photonic integrated circuit (PIC)
- etched facets
- vertical couplers
- on-wafer testing