Fabrication of dual layer, dual width waveguides for dispersion engineered InP photonic circuits

Jon Øyvind Kjellman, Ripalta Stabile, Kevin A. Williams

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

Abstract

Dual layer, dual width waveguides exhibiting enhanced chromatic dispersion can enable photonic circuits for ultrafast optical pulses.With common tools and processes we here demonstrate the creation of the necessary waveguide geometry. 2.6dBcm-1 shallow waveguide losses validate our process strategy.

Original languageEnglish
Title of host publication30th Annual Conference of the IEEE Photonics Society, IPC 2017
Place of PublicationPiscataway
PublisherInstitute of Electrical and Electronics Engineers
Pages543-544
Number of pages2
ISBN (Electronic)978-1-5090-6578-3
ISBN (Print)978-1-5090-6579-0
DOIs
Publication statusPublished - 20 Nov 2017
Event30th Annual Conference of the IEEE Photonics Society (IPC 2017) - Lake Buena Vista, United States
Duration: 1 Oct 20175 Oct 2017
Conference number: 30
https://ieeexplore.ieee.org/stamp/stamp.jsp?arnumber=8115973

Conference

Conference30th Annual Conference of the IEEE Photonics Society (IPC 2017)
Abbreviated titleIPC 2017
CountryUnited States
CityLake Buena Vista
Period1/10/175/10/17
Internet address

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Cite this

Kjellman, J. Ø., Stabile, R., & Williams, K. A. (2017). Fabrication of dual layer, dual width waveguides for dispersion engineered InP photonic circuits. In 30th Annual Conference of the IEEE Photonics Society, IPC 2017 (pp. 543-544). Piscataway: Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/IPCon.2017.8116215