Fabrication of an efficient metal grating coupler for membrane-based integrated photonics

A. Higuera Rodriguez, V.M. Dolores Calzadilla, D. Heiss, M.K. Smit

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Abstract

This paper reports the progress on the fabrication process of highly efficient metal grating couplers for membrane-based integrated circuits, using double side processing technology on bonded samples. This type of gratings comprises a buried SiO2/Ag grating of 125nm thickness with a silver layer as metal mirror, and has several advantages over dielectric gratings as metallic gratings are independent from the buffer thickness. We predict a theoretical chip-to-fiber coupling efficiency of 74% and 89% for uniform and apodized gratings respectively, at a wavelength of 1550 nm. Furthermore, the fabrication process can be used for both, SOI and III-V based platforms.
Original languageEnglish
Title of host publicationProceedings of the 19th Annual Symposium of the IEEE Photonics Society Benelux Chapter, 3-4 November 2014, Enschede, The Netherlands
EditorsS Garcia-Blanco, K.J. Boller, D Douwe Geuzerbroek
Place of PublicationEnschede
PublisherTwente University
Pages51-54
ISBN (Print)978-90-365-3778-0
Publication statusPublished - 2014

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