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Fabrication and characterization of a wet-etched InP-based vertical coupling mirror

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Abstract

In this work we describe the fabrication and characterization of couplers realized with a wet etching process that is compatible with the standard COBRA active-passive process. The implementation of this broadband structure allows for wafer-scale waveguide-loss and absolute-wavelength measurements.
Original languageEnglish
Title of host publicationProceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven
EditorsX.J.M. Leijtens, D. Pustakhod
Place of PublicationEindhoven
PublisherTechnische Universiteit Eindhoven
Pages179-182
ISBN (Print)978-90-386-3512-5
Publication statusPublished - 2013

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