Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	IPR 2004, San Francisco, USA
Pages	IThG4-
Publication status	Published - 2004
Event	conference; IPR 2004; 2004-06-30; 2004-07-04 - Duration: 30 Jun 2004 → 4 Jul 2004

Cite this

@inproceedings{21322001dc9d4ebdb51a32d27b4ea299,

title = "Extremely small AWG demultiplexer fabricated on InP by using a double-etch process",

author = "Y. Barbarin and X.J.M. Leijtens and E.A.J.M. Bente and C.M. Louzao and J. Kooiman and M.K. Smit",

year = "2004",

language = "English",

pages = "IThG4--",

booktitle = "IPR 2004, San Francisco, USA",

note = "conference; IPR 2004; 2004-06-30; 2004-07-04 ; Conference date: 30-06-2004 Through 04-07-2004",

}

TY - GEN

T1 - Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

AU - Barbarin, Y.

AU - Leijtens, X.J.M.

AU - Bente, E.A.J.M.

AU - Louzao, C.M.

AU - Kooiman, J.

AU - Smit, M.K.

PY - 2004

Y1 - 2004

M3 - Conference contribution

SP - IThG4-

BT - IPR 2004, San Francisco, USA

T2 - conference; IPR 2004; 2004-06-30; 2004-07-04

Y2 - 30 June 2004 through 4 July 2004

ER -