Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin; X.J.M. Leijtens; E.A.J.M. Bente; C.M. Louzao; J. Kooiman; M.K. Smit

doi:10.1109/LPT.2004.835217

Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin, X.J.M. Leijtens, E.A.J.M. Bente, C.M. Louzao, J. Kooiman, M.K. Smit

Photonic Integration

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Abstract

A compact low-loss 4×4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 µm. This small radius and a reduction of the number of array arms, reduces the device size to only 230×330 µm2. Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date

Original language	English
Pages (from-to)	2478-2480
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	16
Issue number	11
DOIs	https://doi.org/10.1109/LPT.2004.835217
Publication status	Published - 2004

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title = "Extremely small AWG demultiplexer fabricated on InP by using a double-etch process",

abstract = "A compact low-loss 4×4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 µm. This small radius and a reduction of the number of array arms, reduces the device size to only 230×330 µm2. Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date",

author = "Y. Barbarin and X.J.M. Leijtens and E.A.J.M. Bente and C.M. Louzao and J. Kooiman and M.K. Smit",

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T1 - Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

AU - Barbarin, Y.

AU - Leijtens, X.J.M.

AU - Bente, E.A.J.M.

AU - Louzao, C.M.

AU - Kooiman, J.

AU - Smit, M.K.

PY - 2004

Y1 - 2004

N2 - A compact low-loss 4×4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 µm. This small radius and a reduction of the number of array arms, reduces the device size to only 230×330 µm2. Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date

AB - A compact low-loss 4×4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 µm. This small radius and a reduction of the number of array arms, reduces the device size to only 230×330 µm2. Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date

U2 - 10.1109/LPT.2004.835217

DO - 10.1109/LPT.2004.835217

M3 - Article

SN - 1041-1135

VL - 16

SP - 2478

EP - 2480

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 11

ER -

Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

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