Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin; X.J.M. Leijtens; E.A.J.M. Bente; J. Kooiman; M.K. Smit

Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin, X.J.M. Leijtens, E.A.J.M. Bente, J. Kooiman, M.K. Smit

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	IEEE/LEOS Benelux Annual Symposium 2003, Enschede, 20-21 November 2003
Place of Publication	Enschede
Publisher	Institute of Electrical and Electronics Engineers
Pages	61-64
Publication status	Published - 2003
Event	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands - Enschede, Netherlands Duration: 20 Nov 2003 → 21 Nov 2003

Conference

Conference	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands
Country/Territory	Netherlands
City	Enschede
Period	20/11/03 → 21/11/03

Cite this

@inproceedings{3f7c5bae4ea44dc9aa0af6c4809b97c1,

title = "Extremely small AWG demultiplexer fabricated on InP by using a double-etch process",

author = "Y. Barbarin and X.J.M. Leijtens and E.A.J.M. Bente and J. Kooiman and M.K. Smit",

year = "2003",

language = "English",

pages = "61--64",

booktitle = "IEEE/LEOS Benelux Annual Symposium 2003, Enschede, 20-21 November 2003",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands ; Conference date: 20-11-2003 Through 21-11-2003",

}

Barbarin, Y, Leijtens, XJM , Bente, EAJM, Kooiman, J & Smit, MK 2003, Extremely small AWG demultiplexer fabricated on InP by using a double-etch process. in IEEE/LEOS Benelux Annual Symposium 2003, Enschede, 20-21 November 2003. Institute of Electrical and Electronics Engineers, Enschede, pp. 61-64, 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands, Enschede, Netherlands, 20/11/03.

Extremely small AWG demultiplexer fabricated on InP by using a double-etch process. / Barbarin, Y.; Leijtens, X.J.M.; Bente, E.A.J.M. et al.
IEEE/LEOS Benelux Annual Symposium 2003, Enschede, 20-21 November 2003. Enschede: Institute of Electrical and Electronics Engineers, 2003. p. 61-64.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

AU - Barbarin, Y.

AU - Leijtens, X.J.M.

AU - Bente, E.A.J.M.

AU - Kooiman, J.

AU - Smit, M.K.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SP - 61

EP - 64

BT - IEEE/LEOS Benelux Annual Symposium 2003, Enschede, 20-21 November 2003

PB - Institute of Electrical and Electronics Engineers

CY - Enschede

T2 - 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands

Y2 - 20 November 2003 through 21 November 2003

ER -