Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin, X.J.M. Leijtens, E.A.J.M. Bente, C.M. Louzao, J. Kooiman, M.K. Smit

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationIPR 2004, San Francisco, USA
PagesIThG4-
Publication statusPublished - 2004
Eventconference; IPR 2004; 2004-06-30; 2004-07-04 -
Duration: 30 Jun 20044 Jul 2004

Conference

Conferenceconference; IPR 2004; 2004-06-30; 2004-07-04
Period30/06/044/07/04
OtherIPR 2004

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