Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure

F.M. Soares; F. Karouta; E.J. Geluk; J.H.C. Zantvoort, van; H. Waardt, de; M.K. Smit

Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure

F.M. Soares, F. Karouta, E.J. Geluk, J.H.C. Zantvoort, van, H. Waardt, de, M.K. Smit

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

8 Downloads (Pure)

Abstract

Low-loss spot size converters (SSC) are important elements for coupling photonic integrated circuits to fibres. We have developed a Cl2-based inductively-coupled-plasma process to etch non-selectively InP and photo-resist (PR). This process was then used to transfer a vertically-tapered PR pattern into an InP/InGaAsP structure. The tapered PR pattern was made using a standard optical lithography combined with sliding-mask technique. One, 2 and 3-mm long SSCs were fabricated and characterized. Excess losses between 0.5-2 dB were measured for all SSCs. We also fabricated lateral SSCs using the same epi-structure, however these SSCs showed higher losses (>4dB/SSC).

Original language	English
Title of host publication	Proceedings of the 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, 2-3 December 2004, Ghent, Belgium
Pages	127-130
Publication status	Published - 2004
Event	9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium - Ghent, Belgium Duration: 2 Dec 2004 → 3 Dec 2004

Conference

Conference	9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium
Country/Territory	Belgium
City	Ghent
Period	2/12/04 → 3/12/04

Cite this

@inproceedings{599a0e3a45014ff886c0051f483ac74f,

title = "Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure",

abstract = "Low-loss spot size converters (SSC) are important elements for coupling photonic integrated circuits to fibres. We have developed a Cl2-based inductively-coupled-plasma process to etch non-selectively InP and photo-resist (PR). This process was then used to transfer a vertically-tapered PR pattern into an InP/InGaAsP structure. The tapered PR pattern was made using a standard optical lithography combined with sliding-mask technique. One, 2 and 3-mm long SSCs were fabricated and characterized. Excess losses between 0.5-2 dB were measured for all SSCs. We also fabricated lateral SSCs using the same epi-structure, however these SSCs showed higher losses (>4dB/SSC).",

author = "F.M. Soares and F. Karouta and E.J. Geluk and {Zantvoort, van}, J.H.C. and {Waardt, de}, H. and M.K. Smit",

year = "2004",

language = "English",

isbn = "90-76546-06-1",

pages = "127--130",

booktitle = "Proceedings of the 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, 2-3 December 2004, Ghent, Belgium",

note = "9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium ; Conference date: 02-12-2004 Through 03-12-2004",

}

Soares, FM, Karouta, F, Geluk, EJ, Zantvoort, van, JHC, Waardt, de, H & Smit, MK 2004, Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure. in Proceedings of the 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, 2-3 December 2004, Ghent, Belgium. pp. 127-130, 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium, Ghent, Belgium, 2/12/04.

Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure. / Soares, F.M.; Karouta, F.; Geluk, E.J. et al.
Proceedings of the 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, 2-3 December 2004, Ghent, Belgium. 2004. p. 127-130.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure

AU - Soares, F.M.

AU - Karouta, F.

AU - Geluk, E.J.

AU - Zantvoort, van, J.H.C.

AU - Waardt, de, H.

AU - Smit, M.K.

PY - 2004

Y1 - 2004

N2 - Low-loss spot size converters (SSC) are important elements for coupling photonic integrated circuits to fibres. We have developed a Cl2-based inductively-coupled-plasma process to etch non-selectively InP and photo-resist (PR). This process was then used to transfer a vertically-tapered PR pattern into an InP/InGaAsP structure. The tapered PR pattern was made using a standard optical lithography combined with sliding-mask technique. One, 2 and 3-mm long SSCs were fabricated and characterized. Excess losses between 0.5-2 dB were measured for all SSCs. We also fabricated lateral SSCs using the same epi-structure, however these SSCs showed higher losses (>4dB/SSC).

AB - Low-loss spot size converters (SSC) are important elements for coupling photonic integrated circuits to fibres. We have developed a Cl2-based inductively-coupled-plasma process to etch non-selectively InP and photo-resist (PR). This process was then used to transfer a vertically-tapered PR pattern into an InP/InGaAsP structure. The tapered PR pattern was made using a standard optical lithography combined with sliding-mask technique. One, 2 and 3-mm long SSCs were fabricated and characterized. Excess losses between 0.5-2 dB were measured for all SSCs. We also fabricated lateral SSCs using the same epi-structure, however these SSCs showed higher losses (>4dB/SSC).

M3 - Conference contribution

SN - 90-76546-06-1

SP - 127

EP - 130

BT - Proceedings of the 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, 2-3 December 2004, Ghent, Belgium

T2 - 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium

Y2 - 2 December 2004 through 3 December 2004

ER -

Extremely low-loss vertically-tapered spot size converter in InP-based waveguide structure

Abstract

Conference

Fingerprint

Cite this