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Extension of the flux fit method for estimating power deposition profiles

  • Jelle H. Slief (Corresponding author)
  • , R.J.R. van Kampen
  • , Michael W. Brookman
  • , Matthijs van Berkel

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

The flux fit method is used to self-consistently estimate the power deposition profile and heat transport profiles from temperature measurements originating from perturbative experiments with a modulated source. This Letter improves on this method by addressing the limitations and assumptions. The most crucial improvement is the additional freedom in the source deposition profile. Allowing for a variable central deposition location and height and including a skewness parameter produces deposition profiles more consistent with the measurement data, but still wider than equilibrium ray tracing in two different DIII-D discharges. Moreover, we show that the quality of the estimated deposition profile is key to the accuracy of diffusivity and convectivity estimates, but inversely, the estimated transport parameters hardly affect the quality of the power deposition estimate. Using this method, we show that the power deposition profile estimate is broadened with respect to ray-tracing by about 1.7–1.8 times in two DIII-D discharges.
Original languageEnglish
Article number010703
Number of pages5
JournalPhysics of Plasmas
Volume29
Issue number1
DOIs
Publication statusPublished - 20 Jan 2022

Funding

This work has been carried out within the framework of the EUROfusion Consortium and has received funding from the Euratom research and training programme 2014–2018 and 2019–2020 under Grant Agreement No. 633053. The views and opinions expressed herein do not necessarily reflect those of the European Commission. Data used in this publication were generated in experiments funded by the U.S. Department of Energy under No. DE-FC02-04ER54698.

FundersFunder number
U.S. Department of EnergyDE-FC02-04ER54698
European Union's Horizon 2020 - Research and Innovation Framework Programme633053

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