Explanation for the leakage current in polycrystalline-silicon thin-film transistors made by Ni-silicide mediated crystallization

P.J. van der Zaag, M.A. Verheijen, S.Y. Yoon, N.D. Young

Research output: Contribution to journalArticleAcademicpeer-review

58 Citations (Scopus)

Abstract

The source of the leakage current in polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) made by Ni-mediated crystallization has been investigated. Studies of TFTs and of the crystallization process by in situ transmission electron microscopy show that the crystallization process is a two-stage process and that the cause of the leakage problem is associated with incomplete crystallization of amorphous-Si. By removing the last pockets of amorphous-Si, for instance, by long anneals, poly-Si TFTs can be made with adequately low leakage current <1 pA/μm (at a source-drain voltage of 5 V) for display applications, despite the presence of Ni up to 2.5×10 19atoms/cm3.

Original languageEnglish
Pages (from-to)3404-3406
Number of pages3
JournalApplied Physics Letters
Volume81
Issue number18
DOIs
Publication statusPublished - 28 Oct 2002
Externally publishedYes

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