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Expansion of the electrons in an EUV-induced plasma in argon
R.M. van der Horst
,
J. Beckers
, E.A. Osorio
,
V.Y. Banine
Elementary Processes in Gas Discharges
Complex Ionized Media
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Engineering
Lithography
100%
Carrier Concentration
100%
Logical Step
50%
Computational Power
50%
Resonant Mode
50%
Term Impact
50%
Spatial Distribution
50%
Resonant Frequency
50%
Physics
Electron Density
100%
Lithography
100%
Resonant Frequency
50%
Physical Process
50%
Spatial Distribution
50%
Material Science
Carrier Concentration
100%
Density
100%
Lithography
100%
Earth and Planetary Sciences
Electron Density
100%
Spatial Distribution
50%
Physical Process
50%
Absorption
50%