TY - JOUR
T1 - Expanding thermal plasma for fast deposition of scratch-resistant SiC/sub x/H/sub y/O/sub z/ films
AU - Barrell, Y.
AU - Creatore, M.
AU - Schaepkens, M.
AU - Iacovangelo, C.D.
AU - Miebach, T.
AU - Sanden, van de, M.C.M.
PY - 2004
Y1 - 2004
N2 - The Ar/O2/hexamethyldisiloxane-fed expanding thermal plasma setup is employed for the deposition of scratch-resistant silicone films on polycarbonate with the purpose of replacing glass by polymers in the architectural and transportation industry. It is shown that the versatile control of parameters in the ETP setup (i.e. arc current, gas flow rates and working pressure) enables specific tuning of the film properties (i.e. chemical composition, optical and mechanical properties). The gas phase is monitored by means of mass spectrometry and cavity ringdown spectroscopy. In situ/ex situ ellipsometry is applied for the optical characterisation of the film. The film composition is determined by means of X-ray photoelectron spectroscopy and the mechanical properties are obtained using nano-indentation measurements. The control parameters are tuned such that the final scratch-resistant films are carbon-deficient and have a strong SiOSi network: stoichiometry SiC0.6HyO1. The low refractive index of 1.42 is due to the presence of residual voids in the film network. The hardness and Young's modulus of the film is 1.2 GPa and 12 GPa, respectively.
AB - The Ar/O2/hexamethyldisiloxane-fed expanding thermal plasma setup is employed for the deposition of scratch-resistant silicone films on polycarbonate with the purpose of replacing glass by polymers in the architectural and transportation industry. It is shown that the versatile control of parameters in the ETP setup (i.e. arc current, gas flow rates and working pressure) enables specific tuning of the film properties (i.e. chemical composition, optical and mechanical properties). The gas phase is monitored by means of mass spectrometry and cavity ringdown spectroscopy. In situ/ex situ ellipsometry is applied for the optical characterisation of the film. The film composition is determined by means of X-ray photoelectron spectroscopy and the mechanical properties are obtained using nano-indentation measurements. The control parameters are tuned such that the final scratch-resistant films are carbon-deficient and have a strong SiOSi network: stoichiometry SiC0.6HyO1. The low refractive index of 1.42 is due to the presence of residual voids in the film network. The hardness and Young's modulus of the film is 1.2 GPa and 12 GPa, respectively.
U2 - 10.1016/j.surfcoat.2003.10.072
DO - 10.1016/j.surfcoat.2003.10.072
M3 - Article
SN - 0257-8972
VL - 180-181
SP - 367
EP - 371
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
ER -