Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms

B.L. Williams, M. Ponomarev, M.A. Verheijen, H.C.M. Knoops, L.A.A. Duval, M.C.M. van de Sanden, M. Creatore

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)
129 Downloads (Pure)
Original languageEnglish
Pages (from-to)54-69
JournalPlasma Processes and Polymers
Volume13
Issue number1
DOIs
Publication statusPublished - Jan 2016

Keywords

  • deposition
  • diagnostics
  • modification
  • plasma
  • polymers

Cite this

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title = "Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms",
keywords = "deposition, diagnostics, modification, plasma, polymers",
author = "B.L. Williams and M. Ponomarev and M.A. Verheijen and H.C.M. Knoops and L.A.A. Duval and {van de Sanden}, M.C.M. and M. Creatore",
year = "2016",
month = "1",
doi = "10.1002/ppap.201500179",
language = "English",
volume = "13",
pages = "54--69",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
publisher = "Wiley-VCH Verlag",
number = "1",

}

Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms. / Williams, B.L.; Ponomarev, M.; Verheijen, M.A.; Knoops, H.C.M.; Duval, L.A.A.; van de Sanden, M.C.M.; Creatore, M.

In: Plasma Processes and Polymers, Vol. 13, No. 1, 01.2016, p. 54-69.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms

AU - Williams, B.L.

AU - Ponomarev, M.

AU - Verheijen, M.A.

AU - Knoops, H.C.M.

AU - Duval, L.A.A.

AU - van de Sanden, M.C.M.

AU - Creatore, M.

PY - 2016/1

Y1 - 2016/1

KW - deposition

KW - diagnostics

KW - modification

KW - plasma

KW - polymers

U2 - 10.1002/ppap.201500179

DO - 10.1002/ppap.201500179

M3 - Article

VL - 13

SP - 54

EP - 69

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

IS - 1

ER -