Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications

R. Groenen; M.C.M. van de Sanden; J. Löffler; R.E.I. Schropp; J.L. Linden

doi:10.1109/PVSC.2000.916009

Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications

R. Groenen
, M.C.M. van de Sanden
, J. Löffler
, R.E.I. Schropp
, J.L. Linden

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

Abstract

A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (> 10 Ω/□), high transmittance (>80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

Original language	English
Title of host publication	Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	822-824
Number of pages	3
ISBN (Electronic)	0780357728
DOIs	https://doi.org/10.1109/PVSC.2000.916009
Publication status	Published - 1 Jan 2000
Event	28th IEEE Photovoltaic Specialists Conference (PVSC 2000) - Anchorage Hilton Hotel, Anchorage, United States Duration: 15 Sept 2000 → 22 Sept 2000 Conference number: 28

Conference

Conference	28th IEEE Photovoltaic Specialists Conference (PVSC 2000)
Abbreviated title	PSVC 2000
Country/Territory	United States
City	Anchorage
Period	15/09/00 → 22/09/00

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10.1109/PVSC.2000.916009

Cite this

Groenen, R., van de Sanden, M. C. M., Löffler, J., Schropp, R. E. I., & Linden, J. L. (2000). Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications. In Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000 (pp. 822-824). Article 916009 Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/PVSC.2000.916009

@inproceedings{ffb8fa22a4bd4da784185e774f18c245,

title = "Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications",

abstract = "A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (> 10 Ω/□), high transmittance (>80\%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10\%.",

author = "R. Groenen and \{van de Sanden\}, M.C.M. and J. L{\"o}ffler and R.E.I. Schropp and J.L. Linden",

year = "2000",

month = jan,

day = "1",

doi = "10.1109/PVSC.2000.916009",

language = "English",

pages = "822--824",

booktitle = "Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "28th IEEE Photovoltaic Specialists Conference (PVSC 2000), PSVC 2000 ; Conference date: 15-09-2000 Through 22-09-2000",

}

Groenen, R, van de Sanden, MCM, Löffler, J, Schropp, REI & Linden, JL 2000, Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications. in Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000., 916009, Institute of Electrical and Electronics Engineers, Piscataway, pp. 822-824, 28th IEEE Photovoltaic Specialists Conference (PVSC 2000), Anchorage, Alaska, United States, 15/09/00. https://doi.org/10.1109/PVSC.2000.916009

Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications. / Groenen, R.; van de Sanden, M.C.M.; Löffler, J. et al.
Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000. Piscataway: Institute of Electrical and Electronics Engineers, 2000. p. 822-824 916009.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - van de Sanden, M.C.M.

AU - Löffler, J.

AU - Schropp, R.E.I.

AU - Linden, J.L.

N1 - Conference code: 28

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N2 - A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (> 10 Ω/□), high transmittance (>80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

AB - A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (> 10 Ω/□), high transmittance (>80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

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DO - 10.1109/PVSC.2000.916009

M3 - Conference contribution

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EP - 824

BT - Conference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000

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T2 - 28th IEEE Photovoltaic Specialists Conference (PVSC 2000)

Y2 - 15 September 2000 through 22 September 2000

ER -

Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications

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