Expanding thermal plasma CVD of textured ZNO with focus on solar cell applications

R. Groenen, M.C.M. van de Sanden, J. Löffler, R.E.I. Schropp, J.L. Linden

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

Abstract

A new method for low temperature deposition of surface textured ZnO is presented utilizing an expanding thermal plasma created by a cascaded arc. Films have been deposited at 150-350°C at a rate of typically 0.65-0.75 nm/s, exhibiting low sheet resistance (> 10 Ω/□), high transmittance (>80%) and a rough surface texture. Surface roughness increases with increasing deposition temperature and film thickness. First pin a-Si:H solar cells deposited on this ZnO show initial efficiencies approaching 10%.

Original languageEnglish
Title of host publicationConference Record of the 28th IEEE Photovoltaic Specialists Conference - 2000
Place of PublicationPiscataway
PublisherInstitute of Electrical and Electronics Engineers
Pages822-824
Number of pages3
ISBN (Electronic)0780357728
DOIs
Publication statusPublished - 1 Jan 2000
Event28th IEEE Photovoltaic Specialists Conference, PVSC 2000 - Anchorage, United States
Duration: 15 Sep 200022 Sep 2000

Conference

Conference28th IEEE Photovoltaic Specialists Conference, PVSC 2000
CountryUnited States
CityAnchorage
Period15/09/0022/09/00

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