Expanding argon-hydrogen plasmas used to dissociate silane for a-Si:H deposition

S. van Egmond, B.A. Korevaar, W.M.M. Kessels, A.H.M. Smets, M.C.M. Sanden, van de, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationAbstract presented at the 14th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG), Malahide, Ireland, August 26-29, 1998 : Abstracts of invited lectures and contributed papers
EditorsD. Riley, C.M.O. Mahony, W.G. Graham
PublisherEuropean Physical Society (EPS)
Pages486-487
Publication statusPublished - 1998
Event14th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG), August 26-29, 1998, Malahide, Ireland - Malahide, Ireland
Duration: 26 Aug 199829 Aug 1998

Conference

Conference14th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG), August 26-29, 1998, Malahide, Ireland
Country/TerritoryIreland
CityMalahide
Period26/08/9829/08/98

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