Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers

R. Jungblut; R. Coehoorn; M.T. Johnson; C. Sauer; P.J. Zaag, van der; A.R. Ball; T.G.S.M. Rijks; J. Stegge, aan de; A. Reinders

doi:10.1016/0304-8853(95)00246-4

Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers

R. Jungblut
, R. Coehoorn
, M.T. Johnson
, C. Sauer
, P.J. Zaag, van der
, A.R. Ball
, T.G.S.M. Rijks
, J. Stegge, aan de
, A. Reinders

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Abstract

The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron Mössbauer studies revealed a roughness of 2–3 Å and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.

Original language	English
Pages (from-to)	300-306
Number of pages	7
Journal	Journal of Magnetism and Magnetic Materials
Volume	148
Issue number	1-2
DOIs	https://doi.org/10.1016/0304-8853(95)00246-4
Publication status	Published - 1995

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@article{b1d26a10907c44ce85dd2b02a98c9d1a,

title = "Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers",

abstract = "The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron M{\"o}ssbauer studies revealed a roughness of 2–3 {\AA} and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.",

author = "R. Jungblut and R. Coehoorn and M.T. Johnson and C. Sauer and \{Zaag, van der\}, P.J. and A.R. Ball and T.G.S.M. Rijks and \{Stegge, aan de\}, J. and A. Reinders",

year = "1995",

doi = "10.1016/0304-8853(95)00246-4",

language = "English",

volume = "148",

pages = "300--306",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers

AU - Jungblut, R.

AU - Coehoorn, R.

AU - Johnson, M.T.

AU - Sauer, C.

AU - Zaag, van der, P.J.

AU - Ball, A.R.

AU - Rijks, T.G.S.M.

AU - Stegge, aan de, J.

AU - Reinders, A.

PY - 1995

Y1 - 1995

N2 - The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron Mössbauer studies revealed a roughness of 2–3 Å and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.

AB - The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron Mössbauer studies revealed a roughness of 2–3 Å and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.

U2 - 10.1016/0304-8853(95)00246-4

DO - 10.1016/0304-8853(95)00246-4

M3 - Article

SN - 0304-8853

VL - 148

SP - 300

EP - 306

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 1-2

ER -

Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers

Abstract

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