Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers

R. Jungblut, R. Coehoorn, M.T. Johnson, C. Sauer, P.J. Zaag, van der, A.R. Ball, T.G.S.M. Rijks, J. Stegge, aan de, A. Reinders

Research output: Contribution to journalArticleAcademicpeer-review

86 Citations (Scopus)
1 Downloads (Pure)


The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron Mössbauer studies revealed a roughness of 2–3 Å and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.
Original languageEnglish
Pages (from-to)300-306
Number of pages7
JournalJournal of Magnetism and Magnetic Materials
Issue number1-2
Publication statusPublished - 1995


Dive into the research topics of 'Exchange biasing in MBE-grown Ni80Fe20/Fe50Mn50 bilayers'. Together they form a unique fingerprint.

Cite this