Original language | English |
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Title of host publication | Proceedings 21st European Photovoltaic Solar Energy Conference, Dresden, Germany |
Pages | 435- |
Publication status | Published - 2006 |
Excellent surface passivation by hydrogenated amorphous silicon deposited at rates >1 nm/s by the expanding thermal plasma technique
B. Hoex, W.M.M. Kessels, M.D. Bijker, M.C.M. Sanden, van de
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic