Excellent Passivation of n‐Type Silicon Surfaces Enabled by Pulsed‐Flow Plasma‐Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide

Jimmy Melskens (Corresponding author), R.J. Theeuwes, Lachlan E. Black, Willem-Jan H. Berghuis, Bart Macco, P.C.P. Bronsveld, W.M.M. Kessels

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