Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition
- I. Volintiru
- , M. Creatore
- , B.J. Kniknie
- , C.I.M.A. Spee
- , M.C.M. Sanden, van de
Research output: Contribution to journal › Article › Academic › peer-review
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