Original language | English |
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Publisher | Impedans Plasma Measurement |
Number of pages | 2 |
Publication status | Published - Aug 2020 |
Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]
Karsten Arts, J.H. Deijkers, Tahsin Faraz, R.L. Puurunen, W.M.M. Kessels, Harm C.M. Knoops
Research output: Book/Report › Report › Academic
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