Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]

Karsten Arts, J.H. Deijkers, Tahsin Faraz, R.L. Puurunen, W.M.M. Kessels, Harm C.M. Knoops

Research output: Book/ReportReportAcademic

60 Downloads (Pure)
Original languageEnglish
PublisherImpedans Plasma Measurement
Number of pages2
Publication statusPublished - Aug 2020

Cite this