Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]

Karsten Arts; J.H. Deijkers; Tahsin Faraz; R.L. Puurunen; W.M.M. Kessels; Harm C.M.  Knoops

Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]

Karsten Arts, J.H. Deijkers, Tahsin Faraz, R.L. Puurunen, W.M.M. Kessels, Harm C.M. Knoops

Plasma & Materials Processing

Research output: Book/Report › Report › Academic

20 Downloads (Pure)

Original language	English
Publisher	Impedans Plasma Measurement
Number of pages	2
Publication status	Published - Aug 2020

Access to Document

2020_august_quantum_qc03Final published version, 196 KB

Cite this

@book{e11aee4311714b25bd1be51a1b0f5f42,

title = "Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]",

author = "Karsten Arts and J.H. Deijkers and Tahsin Faraz and R.L. Puurunen and W.M.M. Kessels and Knoops, {Harm C.M.}",

year = "2020",

month = aug,

language = "English",

publisher = "Impedans Plasma Measurement",

}

TY - BOOK

T1 - Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System

T2 - Application note [QC03]

AU - Arts, Karsten

AU - Deijkers, J.H.

AU - Faraz, Tahsin

AU - Puurunen, R.L.

AU - Kessels, W.M.M.

AU - Knoops, Harm C.M.

PY - 2020/8

Y1 - 2020/8

M3 - Report

BT - Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System

PB - Impedans Plasma Measurement

ER -