EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology

Job Beckers (Corresponding author), Tijn van de Ven, Ruud van der Horst, Dmitry .I. Astakhov, Vadim Banine

Research output: Contribution to journalReview articlepeer-review

7 Citations (Scopus)
142 Downloads (Pure)

Abstract

After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them.

Original languageEnglish
Article number2827
Number of pages23
JournalApplied Sciences
Volume9
Issue number14
DOIs
Publication statusPublished - 2 Jul 2019

Keywords

  • Extreme Ultraviolet
  • lithography
  • EUV
  • EUV-induced plasma
  • photon-induced plasma
  • MCRS
  • Electron density
  • Ion energy distribution function
  • IEDF
  • EUVL
  • Lithography
  • Photon-induced plasma

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